New dual side-on interface (DSOI) adds sensitivity and eliminates contamination/matrix compatibility issues
One instrument instead of two: Only MultiView plasma instrument in the market ‒ true axial AND true radial (single or dual) plasma observation in one instrument
ORCA Optical System: Simultaneous spectrum capture in the 130-770 nm wavelength range with up to 5x more sensitivity than Echelle based systems ‒ delivers best in class performance in the UV/VUV range
The SPECTRO ARCOS inductively coupled plasma optical emission spectrometer (ICP-OES) excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.
The periscope-free MultiView mechanism lets an operator literally "turn" a radial-view instrument into an axial-view device, or vice-versa, in 90 seconds or less. MultiView now includes dual side-on plasma observation. The two optical interfaces add sensitivity and eliminate contamination/matrix compatibility issues.
Line-array detectors, based on complementary metal-oxide-semiconductor (CMOS) technology, eliminates blooming, reads trace elements’ low signals even in the vicinity of intense matrix lines, offers a high dynamic range, and eliminates on-chip cooling.
The design of the SPECTRO ARCOS ensures exceptionally low operating costs over a long, reliable service life. And it packs a modern, ergonomic chassis with proven features such as no-purge UV-PLUS sealed gas purification technology, proprietary air-cooling, optional intelligent valve system, and portable video camera for remote monitoring.
The new SPECTRO ARCOS is available in six versions